半导体组件的生产对颗粒物和金属污染仍然极为敏感。随着功能尺寸的不断微缩，对洁净度的需求将继续增加。各种类型的泵用于大批量化学品输送系统、循环式批次蚀刻和其他高洁净工艺应用。许多的泵会脱落大量颗粒，这些颗粒可能会降低产品产量或影响工艺中使用过滤器的性能或寿命。此外，化学品中加工过程的金属污染可导致各种与产品良率相关的问题。本文中使用三家制造商的两种类型的高洁净泵，评估不同操作条件下微量金属渗出和颗粒脱落的水平。
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