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Trace Metal Dynamic Extraction from Five Pumps in Hydrochloric Acid

  • Microelectronics
  • Pump Comparison
  • Diaphragm Pumps
  • Trace Metal Contamination
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Exposure of a pump’s wetted surface area to acids can result in leach out of trace metals.  Trace metal contamination causes alteration of electrical properties in semiconductor devices. The wetted surface area of a Levitronix® pump is several times smaller than diaphragm pumps of comparable hydraulic power.

Test conditions
35 % HCl was used as extractant. Continuous flow of the exctractant was maintained through the pumps during each test. A background sample was taken prior to each test and further samples were taken at approximately even spaced time intervals on a logarithmic scale. The results of the analyses were converted to cumulative mass extracted.

The surface contamination from diaphragm pumps compared to Levitronix® pumps was up to 9 times higher.


Trace metal extraction of three Levitronix® pumps compared to two diaphragm pumps

Author Marc Litchy
Company CT Associates
Document Number LTX 977B 1979
Pages 17