Facts

Exposure of a pump’s wetted surface area to acids can result in leach out of trace metals.  Trace metal contamination causes alteration of electrical properties in semiconductor devices. The wetted surface area of a Levitronix^® pump is several times smaller than diaphragm pumps of comparable hydraulic power.

Test conditions
35 % HCl was used as extractant. Continuous flow of the exctractant was maintained through the pumps during each test. A background sample was taken prior to each test and further samples were taken at approximately even spaced time intervals on a logarithmic scale. The results of the analyses were converted to cumulative mass extracted.

Results
The surface contamination from diaphragm pumps compared to Levitronix^® pumps was up to 9 times higher.

Trace metal extraction of three Levitronix^® pumps compared to two diaphragm pumps